Dr. Tarkeshwar Patil, "Detailed AFM Study of the Effect of Variation in Deposition Rate and with Progressive Annealing on Silicon Nanostructures Deposited using HWCVD," International Journal of Applied Sciences & Development, vol. 5, pp. 48-51, 2026, DOI:10.37394/232029.2026.5.6
Dr. Tarkeshwar Patil. Detailed AFM Study of the Effect of Variation in Deposition Rate and with Progressive Annealing on Silicon Nanostructures Deposited using HWCVD.
International Journal of Applied Sciences & Development. 2026;5:48-51. 10.37394/232029.2026.5.6
International Journal of Applied Sciences & Development
E-ISSN: 2945-0454
Volume 5, 2026
Detailed AFM Study of the Effect of Variation in Deposition Rate and with Progressive Annealing on Silicon Nanostructures Deposited using HWCVD
Author:
Abstract: As there is hardly any work carried out on effect of growth variations on Silicon Nanocrystals / nanostructures, we experimented and found that as the deposition rate is increased the structures the height of the nanostructures also increased. Further the appearance of the nanostructures and their evolution with annealing is being reported for the first time.
Keywords:
HWCVD, Silicon Nanostructures, AFM, Annealing, Deposition Rate, Growth, Silicon Nanocrystals
Pages: 48-51 DOI: 10.37394/232029.2026.5.6WSEAS Transactions on International Journal of Applied Sciences & Development, E-ISSN: 2945-0454, Volume 5, 2026, Art. #6
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